Tungsten carbide nanowalls as electrocatalyst for hydrogen evolution reaction: New approach to durability issue

Authors
Ko, Young-JinCho, Jung-MinKim, InhoJeong, Doo SeokLee, Kyeong-SeokPark, Jong-KeukBaik, Young-JoonChoi, Heon-JinLee, Wook-Seong
Issue Date
2017-04
Publisher
Elsevier BV
Citation
Applied Catalysis B: Environmental, v.203, pp.684 - 691
Abstract
We report a new approach to the durability issue in tungsten carbide electrocatalyst for hydrogen evolution reaction (HER), in a form radically differing from that of the conventional nanoparticle approach: the WC nanowalls, bottom-up grown by a plasma-assisted deposition on Si wafer. The pristine nanowall was highly crystalline and its surface was smooth in atomic scale, which enabled a superior durability in HER environment: no oxidation occurred at prolonged cycling (10,000 cycles) in the HER environment, even without additional functionalization or modification. The electrochemical activity, as presented by Tafel slope and turnover frequency (TOF), was as excellent as those of the best data in the literature. (C) 2016 Elsevier B.V. All rights reserved.
Keywords
THIN-FILM; CARBON; WATER; NANOPARTICLES; DEPOSITION; CATALYSIS; ENERGY; Hydrogen evolution; Tungsten carbide; Nanowall structure; Electrochemical durability; Turnover frequency
ISSN
0926-3373
URI
https://pubs.kist.re.kr/handle/201004/122884
DOI
10.1016/j.apcatb.2016.10.085
Appears in Collections:
KIST Article > 2017
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE