New alicyclic polymers based on protected dinorbornene monomers for application as deep UV resists

Title
New alicyclic polymers based on protected dinorbornene monomers for application as deep UV resists
Authors
안광덕강종희이찬우김종만한동근이재형조의환문성윤구재석이상균
Keywords
alicyclic polyners; t-bocnb; t-bdn; deep uv resists
Issue Date
1998-01
Publisher
Journal of photopolymer science and technology; [Fotoporimā Konwakai shi]
Citation
VOL 11, NO 3, 499-504
URI
http://pubs.kist.re.kr/handle/201004/12403
ISSN
0914-9244
Appears in Collections:
KIST Publication > Article
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