Kinetics of chemical vapor deposition of silicon on Ni substrate from a gas mixture of SiCl₄ and H₂

Title
Kinetics of chemical vapor deposition of silicon on Ni substrate from a gas mixture of SiCl₄ and H₂
Authors
윤진국유재은맹선재정병성김재수최종술
Keywords
kinetics
Issue Date
1998-10
Publisher
대한금속학회지
Citation
VOL 36, NO 10, 1655-1662
URI
http://pubs.kist.re.kr/handle/201004/12502
Appears in Collections:
KIST Publication > Article
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