t-BOC protected alicyclic polymers for applications as high resolution ArF photoresists

Title
t-BOC protected alicyclic polymers for applications as high resolution ArF photoresists
Authors
강종희신중한이재형김종만한동근안광덕
Issue Date
1998-12
Publisher
한국화상학회
Citation
, 50-50
URI
http://pubs.kist.re.kr/handle/201004/12516
Appears in Collections:
KIST Publication > Conference Paper
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