A simple PAN-based fabrication method for microstructured carbon electrodes for organic field-effect transistors

Authors
Jung, Chan-HeeKim, Wan-JoongJung, Chang-HeeHwang, In-TaeKhim, DongyoonKim, Dong-YuLee, Jae-SukKu, Bon-CheolChoi, Jae-Hak
Issue Date
2015-06
Publisher
PERGAMON-ELSEVIER SCIENCE LTD
Citation
CARBON, v.87, pp.257 - 268
Abstract
Facile and efficient fabrication of polyacrylonitrile (PAN)-based conductive graphitic carbon microstructures (GCMs) and their application to the electrodes of organic field-effect transistors (OFETs) is described. The PAN thin films spin-coated on a SiO2-deposited Si wafer was irradiated through a pattern mask with 150 key H+ ions at various fluences, and subsequently developed to form PAN microstructures. The resulting PAN microstructures were carbonized at various temperatures to create the GCMs. The analytical results revealed that the optimized fluence and carbonization temperature for well-defined GCMs was 3 x 10(15) - ions cm(-2) and 100 degrees C, respectively, and that the resulting GCMs created at the optimized condition exhibited a greatly low surface roughness of 0.36 nm, a good electrical conductivity of about 600 S cm(-1), and a high work function of 5.11 eV. Noticeably, the GCM electrodes-based p-type OFET showed a comparable performance to that of the gold electrode-based one, demonstrating that the practical use of GCMs as cheap electrodes to replace expensive metallic ones for organic electronic devices. (C) 2015 Elsevier Ltd. All rights reserved.
Keywords
ION-BEAM; THERMAL STABILIZATION; THIN-FILMS; POLYACRYLONITRILE; LITHOGRAPHY; GRAPHENE; FIBER; RESIST; OXIDE; AIR; ION-BEAM; THERMAL STABILIZATION; THIN-FILMS; POLYACRYLONITRILE; LITHOGRAPHY; GRAPHENE; FIBER; RESIST; OXIDE; AIR; PAN; Graphene; FET
ISSN
0008-6223
URI
https://pubs.kist.re.kr/handle/201004/125375
DOI
10.1016/j.carbon.2015.02.040
Appears in Collections:
KIST Article > 2015
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