Comparison between TiO₂ thin films on InP and GaAs substrates by metalorganic chemical vapor deposition

Title
Comparison between TiO₂ thin films on InP and GaAs substrates by metalorganic chemical vapor deposition
Authors
한영기이태경염상섭손맹호김은규민석기이정용
Keywords
MOCVD; Thin films; TiO₂; GaAs; InP
Issue Date
1998-02
Publisher
Journal of the Korean Physical Society
Citation
VOL 32, S1697-S1699
URI
http://pubs.kist.re.kr/handle/201004/12557
ISSN
0374-4884
Appears in Collections:
KIST Publication > Article
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