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dc.contributor.authorKim, Sun Jin-
dc.contributor.authorWe, Ju Hyung-
dc.contributor.authorKim, Jin Sang-
dc.contributor.authorKim, Gyung Soo-
dc.contributor.authorCho, Byung Jin-
dc.date.accessioned2024-01-20T10:33:54Z-
dc.date.available2024-01-20T10:33:54Z-
dc.date.created2021-09-05-
dc.date.issued2014-01-05-
dc.identifier.issn0925-8388-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/127231-
dc.description.abstractWe herein report the thermoelectric properties of Sb2Te3 thick film fabricated by a screen-printing technique and a subsequent annealing process. Each step of the screen-printing fabrication process of Sb2Te3 thick film is described in detail. It was found that the subsequent annealing process must be carefully designed to achieve good thermoelectric properties of the screen-printed film. The results show that the annealing of the screen-printed Sb2Te3 thick film together with tellurium powder in the same process chamber significantly improves the carrier mobility by increasing the average scattering time of the carrier in the film, resulting in a large improvement of the power factor. By optimizing the annealing process, we achieved a maximum thermoelectric figure-of-merit, ZT, of 0.32 at room temperature, which is slightly higher than that of bulk Sb2Te3. Because screen-printing is a simple and low-cost process and given that it is easy to scale up to large sizes, this result will be useful for the realization of large, film-type thermoelectric devices. (c) 2013 Elsevier B.V. All rights reserved.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE SA-
dc.subjectTELLURIDE-
dc.titleThermoelectric properties of P-type Sb2Te3 thick film processed by a screen-printing technique and a subsequent annealing process-
dc.typeArticle-
dc.identifier.doi10.1016/j.jallcom.2013.07.195-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJOURNAL OF ALLOYS AND COMPOUNDS, v.582, pp.177 - 180-
dc.citation.titleJOURNAL OF ALLOYS AND COMPOUNDS-
dc.citation.volume582-
dc.citation.startPage177-
dc.citation.endPage180-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000325468100030-
dc.identifier.scopusid2-s2.0-84883200883-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryMetallurgy & Metallurgical Engineering-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaMetallurgy & Metallurgical Engineering-
dc.type.docTypeArticle-
dc.subject.keywordPlusTELLURIDE-
dc.subject.keywordAuthorSb2Te3 thick film-
dc.subject.keywordAuthorScreen-printing technique-
dc.subject.keywordAuthorLow-cost-
dc.subject.keywordAuthorSubsequent annealing-
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KIST Article > 2014
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