Effects of Cu seeding layer on Si grown by partially ionized beam in plasma enhanced chemical vapor deposition

Title
Effects of Cu seeding layer on Si grown by partially ionized beam in plasma enhanced chemical vapor deposition
Authors
고석근최성창김기환정형진최광진양호식조영상
Keywords
plasma enhanced chemical vapor deposition; partially ionized beam; seed layer; adhesion; copper
Issue Date
1999-01
Publisher
Thin solid films
Citation
VOL 347, 121-126
URI
http://pubs.kist.re.kr/handle/201004/12777
ISSN
0040-6090
Appears in Collections:
KIST Publication > Article
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