Room-temperature ferromagnetism of Cu ion-implanted Ga-doped ZnO

Authors
Lee, Jong-HanShin, SangwonChae, Keun HwaKim, DonghwanSong, Jonghan
Issue Date
2012-05
Publisher
ELSEVIER SCIENCE BV
Citation
CURRENT APPLIED PHYSICS, v.12, no.3, pp.924 - 927
Abstract
1 MeV Cu2+ ions have been implanted into un-doped ZnO and Ga-doped ZnO films with a dose of 1 x 10(17) ions/cm(2) at room-temperature. Cu ion-implanted Ga-doped ZnO had ferromagnetism at room-temperature and the saturation magnetization of this sample was estimated to be 0.12 mu(B) per Cu, while the Cu ion-implanted un-doped ZnO did not show ferromagnetic behavior. Near-edge X-ray fine structure (NEXAFS) spectroscopy revealed that a partial amount of implanted Cu ions existed as Cu2+ (d(9)) state in Ga-doped ZnO film. On the other hand, almost Cu atoms existed as Cu1+ (d(10)) state in un-doped ZnO film. However, the subsequent annealing at temperature above 800 degrees C on this ferromagnetic sample induced the annihilation of ferromagnetism due to the formation of non-ferromagnetic Cu2O phase. (C) 2012 Published by Elsevier B.V.
Keywords
DILUTED MAGNETIC SEMICONDUCTORS; THIN-FILMS; OXIDE; DILUTED MAGNETIC SEMICONDUCTORS; THIN-FILMS; OXIDE; Dilute magnetic semiconductor; Ferromagnetic; Copper implantation; ZnO
ISSN
1567-1739
URI
https://pubs.kist.re.kr/handle/201004/129316
DOI
10.1016/j.cap.2011.12.013
Appears in Collections:
KIST Article > 2012
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