Self-Assembled Growth of GaAs Anti Quantum Dots in InAs Matrix by Migration Enhanced Molecular Beam Epitaxy

Abstract

Self-assembled GaAs anti quantum dots (AQDs) were grown in an In As matrix via migration enhanced molecular beam epitaxy. The transmission electron microscopy image showed that the 2D to 3D transition thickness is below 1.5 monolayers (MLs) of GaAs coverage. The average diameter and height of the GaAs AQDs for 1.5 ML GaAs coverage taken from the atomic force microscopy image were similar to 29.0 nm and 1.4 nm, respectively. The density was similar to 6.0 x 10(10) cm(-2). The size of the AQDs was enlarged in the In As matrix compared with that on the surface. These results indicate that the GaAs AQDs in the In As matrix under tensile strain can be effectively formed with the assistance of the migration enhanced epitaxy method.