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dc.contributor.authorLee, H. S.-
dc.contributor.authorLee, Y. S.-
dc.contributor.authorSeo, S. H.-
dc.contributor.authorChang, H. Y.-
dc.date.accessioned2024-01-20T16:32:24Z-
dc.date.available2024-01-20T16:32:24Z-
dc.date.created2021-09-05-
dc.date.issued2011-08-01-
dc.identifier.issn0040-6090-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/130085-
dc.description.abstractThe characteristics of the multi-hole electrode RF capacitively coupled plasma are experimented and analyzed. Neon, argon and krypton are discharged with various pressures, powers and electrode hole diameters. The relationship of plasma density and hole diameter of the electrode is compared in various gas plasma discharges. The data can be a reference for the design of a multi-hole electrode for high density RF capacitively coupled plasma discharge. (C) 2011 Published by Elsevier B.V.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE SA-
dc.subjectSOLAR-CELLS-
dc.subjectSI-
dc.subjectSILICON-
dc.subjectGROWTH-
dc.titleThe characteristics of the multi-hole RF capacitively coupled plasma discharged with neon, argon and krypton-
dc.typeArticle-
dc.identifier.doi10.1016/j.tsf.2011.04.139-
dc.description.journalClass1-
dc.identifier.bibliographicCitationTHIN SOLID FILMS, v.519, no.20, pp.6955 - 6959-
dc.citation.titleTHIN SOLID FILMS-
dc.citation.volume519-
dc.citation.number20-
dc.citation.startPage6955-
dc.citation.endPage6959-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000294790900069-
dc.identifier.scopusid2-s2.0-80051546722-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle; Proceedings Paper-
dc.subject.keywordPlusSOLAR-CELLS-
dc.subject.keywordPlusSI-
dc.subject.keywordPlusSILICON-
dc.subject.keywordPlusGROWTH-
dc.subject.keywordAuthorHole diameter-
dc.subject.keywordAuthorPlasma density-
dc.subject.keywordAuthorHollow cathode-
dc.subject.keywordAuthorMulti-hole electrode-
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KIST Article > 2011
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