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dc.contributor.authorJung, Sung-Mok-
dc.contributor.authorKim, Young-Hwan-
dc.contributor.authorKim, Seong-Il-
dc.contributor.authorYoo, Sang-Im-
dc.date.accessioned2024-01-20T17:03:20Z-
dc.date.available2024-01-20T17:03:20Z-
dc.date.created2021-09-02-
dc.date.issued2011-05-
dc.identifier.issn1567-1739-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/130385-
dc.description.abstractZnS and ZnS-MgF2 composite films were prepared on soda-lime glass substrates and MgF2 films on GaAs by rf magnetron sputtering to investigate multi-layer antireflection (AR) coatings. Optical constants of these films were determined by envelope method and spectroscopic ellipsometry. In particular, ZnS-MgF2 composite films were fabricated by co-sputtering of ZnS and MgF2 target to obtain intermediate refractive index material for a middle layer in the triple-layer AR coating and these films exhibited the desired intermediate refractive index. Based on the extracted optical constants, single-, double- and triple-layer AR coatings on GaAs substrates were designed and fabricated by rf magnetron sputtering. Low reflectance could be obtained from single-layer AR coating only at a specific wavelength and could be obtained from multi-layer AR coating at wide wavelength regime. Additionally, incident angle dependence of the reflectance of the multi-layer AR coatings was also investigated and showed different behavior according to a number of layers. (C) 2010 Elsevier B.V. All rights reserved.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE BV-
dc.subjectTHIN-FILMS-
dc.subjectOPTICAL-PROPERTIES-
dc.subjectPOROUS SILICON-
dc.subjectTEMPERATURE-
dc.subjectEVAPORATION-
dc.subjectDEPOSITION-
dc.subjectTHICKNESS-
dc.subjectCONSTANTS-
dc.titleDesign and fabrication of multi-layer antireflection coating for III-V solar cell-
dc.typeArticle-
dc.identifier.doi10.1016/j.cap.2010.09.010-
dc.description.journalClass1-
dc.identifier.bibliographicCitationCURRENT APPLIED PHYSICS, v.11, no.3, pp.538 - 541-
dc.citation.titleCURRENT APPLIED PHYSICS-
dc.citation.volume11-
dc.citation.number3-
dc.citation.startPage538-
dc.citation.endPage541-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
dc.identifier.kciidART001553412-
dc.identifier.wosid000288183300050-
dc.identifier.scopusid2-s2.0-79951670848-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusOPTICAL-PROPERTIES-
dc.subject.keywordPlusPOROUS SILICON-
dc.subject.keywordPlusTEMPERATURE-
dc.subject.keywordPlusEVAPORATION-
dc.subject.keywordPlusDEPOSITION-
dc.subject.keywordPlusTHICKNESS-
dc.subject.keywordPlusCONSTANTS-
dc.subject.keywordAuthorZinc sulfide-
dc.subject.keywordAuthorMagnesium fluoride-
dc.subject.keywordAuthorAntireflection coating-
dc.subject.keywordAuthorOptical constants-
dc.subject.keywordAuthorrf magnetron sputtering-
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