Simulations of stress evolution and the current density scaling of electromigration-induced failure times in pure and alloyed interconnects

Title
Simulations of stress evolution and the current density scaling of electromigration-induced failure times in pure and alloyed interconnects
Authors
박영준Vaibhav K. AndleighCarl V. Thompson
Keywords
electromigration; computer simulation; stress evolution
Issue Date
1999-04
Publisher
Journal of applied physics
Citation
VOL 85, NO 7, 3546-3555
URI
http://pubs.kist.re.kr/handle/201004/13056
ISSN
0021-8979
Appears in Collections:
KIST Publication > Article
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