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dc.contributor.author박영준-
dc.contributor.authorVaibhav K. Andleigh-
dc.contributor.authorCarl V. Thompson-
dc.date.accessioned2015-12-02T05:06:42Z-
dc.date.available2015-12-02T05:06:42Z-
dc.date.issued199904-
dc.identifier.citationVOL 85, NO 7, 3546-3555-
dc.identifier.issn0021-8979-
dc.identifier.other11043-
dc.identifier.urihttp://pubs.kist.re.kr/handle/201004/13056-
dc.publisherJournal of applied physics-
dc.subjectelectromigration-
dc.subjectcomputer simulation-
dc.subjectstress evolution-
dc.titleSimulations of stress evolution and the current density scaling of electromigration-induced failure times in pure and alloyed interconnects-
dc.typeArticle-
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