Atomic Arrangements of Asymmetrically-tilted Grain Boundaries in 30 degrees Rotation Domains of ZnO Thin Films Grown on n-Si Substrates

Authors
Yuk, J. M.No, Y. S.Kim, T. W.Kim, J. Y.Choi, W. K.
Issue Date
2009-07
Publisher
KOREAN PHYSICAL SOC
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.55, no.1, pp.246 - 249
Abstract
Selected-area electron diffraction patterns for ZnO/Si heterostructures annealed at 800 degrees C showed that 30 degrees rotation domains were generated in the ZnO thin films. The plane-view high-resolution transmission electron microscopy (HRTEM) images for the ZnO thin films grown on n-Si substrates annealed at 800 degrees C showed that asymmetrical tilt grain boundaries were tilted by 16.5 degrees and 13.5 degrees from two grains with a 30 degrees tilted angle. The grain boundary planes of the two grains were (35 (8) over bar0) and (23 (5) over bar0). The atomic arrangements of the asymmetrically-tilted grain boundaries in 30 degrees rotation domains of ZnO thin films grown on n-Si substrates annealed at 800 degrees C are described on the basis of the HRTEM results.
Keywords
OPTICAL-PROPERTIES; EPITAXIAL-FILMS; BUFFER LAYER; TEMPERATURE; DEPENDENCE; EMISSION; EDGE; OPTICAL-PROPERTIES; EPITAXIAL-FILMS; BUFFER LAYER; TEMPERATURE; DEPENDENCE; EMISSION; EDGE; ZnO thin film; Si substrate; Rotation domain; Grain boundary; Atomic arrangement
ISSN
0374-4884
URI
https://pubs.kist.re.kr/handle/201004/132328
DOI
10.3938/jkps.55.246
Appears in Collections:
KIST Article > 2009
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