Shrinkage and expansion mechanisms of SiO2 elliptical membrane nanopores

Authors
Shin, Jae WonLee, Jeong YongOh, Do HyunKim, Tae WhanCho, Woon Jo
Issue Date
2008-12-01
Publisher
AMER INST PHYSICS
Citation
APPLIED PHYSICS LETTERS, v.93, no.22
Abstract
20 nm SiO2 elliptical membrane nanopores with various thicknesses were directly formed in situ by using a focused electron beam with transmission electron microscopy (TEM). The shrinkage and the expansion behaviors of the SiO2 ellipse nanopores with different thicknesses were attributed to variations in their geometries, in particular their curvatures. The geometric mechanisms of elliptical nanopores with various thicknesses fabricated utilizing a SiO2 membrane with a thickness gradient by using an electron beam irradiation are described on the basis of TEM images, which depend on the electron beam irradiation time.
Keywords
DNA TRANSLOCATION; DISCRIMINATION; MOLECULES; FABRICATION; TRANSPORT; DNA TRANSLOCATION; DISCRIMINATION; MOLECULES; FABRICATION; TRANSPORT; electron beam effects; geometry; nanoporous materials; nanotechnology; shrinkage; silicon compounds; transmission electron microscopy
ISSN
0003-6951
URI
https://pubs.kist.re.kr/handle/201004/132888
DOI
10.1063/1.3027062
Appears in Collections:
KIST Article > 2008
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