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dc.contributor.author권성도-
dc.contributor.author주병권-
dc.contributor.author윤석진-
dc.contributor.author김진상-
dc.date.accessioned2024-01-20T22:06:18Z-
dc.date.available2024-01-20T22:06:18Z-
dc.date.created2021-09-06-
dc.date.issued2008-12-
dc.identifier.issn1226-7945-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/132937-
dc.description.abstractBismuth-telluride based thin film materials are grown by Metal Organic Chemical Vapor Deposition(MOCVD). A planar type thermoelectric device has been fabricated using p-type Bi0.₄Sb1.6Te₃ and n-type Bi₂Te₃ thin films. Firstly, the p-type thermoelectric element was patterned after growth of 4 μm thickness of Bi0.₄Sb1.6Te₃ layer. Again n-type Bi₂Te₃ film was grown onto the patterned p-type thermoelectric film and n-type strips are formed by using selective chemical etchant for Bi₂Te₃. The top electrical connector was formed by thermally deposited metal film. The generator consists of 20 pairs of p- and n-type legs. We demonstrate complex structures of different conduction types of thermoelectric element on same substrate by two separate runs of MOCVD with etch-stop layer and selective etchant for n-type thermoelectric material. Device performance was evaluated on a number of thermoelectric devices. To demonstrate power generation, one side of the sample was heated by heating block and the voltage output measured. As expected for a thermoelectric generator, the voltage decreases linearly, while the power output rises to a maximum. The highest estimated power of 1.3 ㎼ is obtained for the temperature difference of 45 K. we provide a promising procedure for fabricating thin film thermoelectric generators by using MOCVD grown thermoelectric materials which may have nanostructure with high thermoelectric properties.-
dc.languageKorean-
dc.publisher한국전기전자재료학회-
dc.titleMOCVD 법에 의한 Bi-Te계 열전소재 제조 및 박막형 열전소자 제작-
dc.title.alternativeGrowth of Bi-Te Based Materials by MOCVD and Fabrication of Thermoelectric Thin Film Devices-
dc.typeArticle-
dc.description.journalClass2-
dc.identifier.bibliographicCitation전기전자재료학회논문지, v.21, no.12, pp.1135 - 1140-
dc.citation.title전기전자재료학회논문지-
dc.citation.volume21-
dc.citation.number12-
dc.citation.startPage1135-
dc.citation.endPage1140-
dc.description.journalRegisteredClasskci-
dc.identifier.kciidART001294571-
dc.subject.keywordAuthorThin film-
dc.subject.keywordAuthorThermoelectric-
dc.subject.keywordAuthorGenerator-
dc.subject.keywordAuthorSeebeck coefficient-
dc.subject.keywordAuthorMOCVD-
dc.subject.keywordAuthorBismuth?telluride-
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KIST Article > 2008
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