Surface energy of the plasma treated Si incorporated diamond-like carbon films

Authors
Roy, Ritwik K.Choi, Heon-WoongPark, Se-JunLee, Kwang-Ryeol
Issue Date
2007-09
Publisher
ELSEVIER SCIENCE SA
Citation
DIAMOND AND RELATED MATERIALS, v.16, no.9, pp.1732 - 1738
Abstract
Surface energy and surface chemical bonds of the plasma treated Si incorporated diamond-like carbon films (Si-DLC) were investigated. The Si-DLC films were prepared by r.f plasma assisted chemical vapor deposition using benzene and diluted silane (SiH4/H-2=10:90) as the precursor gases. The Si-DLC films were subjected to plasma treatment using various gases like N-2, O-2, H-2 and CF4. The plasma treated Si-DLC films showed a wide range of water contact angles from 13.4 degrees to 92.1 degrees. The surface energies of the plasma treated Si-DLC films revealed a high polar component for O-2 plasma treated Si-DLC films and a low polar component for CF4 plasma treated Si-DLC films. The CF4 plasma treated Si-DLC films indicated the minimum surface energy. X-ray photoelectron spectroscopy (XPS) revealed that the polarizability of the bonds present on the surface explains the hydrophilicity and hydrophobicity of the plasma treated Si-DLC films. We also suggest that the 0, plasma treated surface can provide an excellent hemocompatible surface from the estimated interfacial energy between the plasma treated Si-DLC surface and human blood. (c) 2007 Elsevier B.V All rights reserved.
Keywords
RAY PHOTOELECTRON-SPECTROSCOPY; BLOOD COMPATIBILITY; THERMAL-STABILITY; DLC-COATINGS; WETTABILITY; SILICON; DEPOSITION; GRAPHITE; RAY PHOTOELECTRON-SPECTROSCOPY; BLOOD COMPATIBILITY; THERMAL-STABILITY; DLC-COATINGS; WETTABILITY; SILICON; DEPOSITION; GRAPHITE; diamond-like carbon; surface energy; surface treatment
ISSN
0925-9635
URI
https://pubs.kist.re.kr/handle/201004/134176
DOI
10.1016/j.diamond.2007.06.002
Appears in Collections:
KIST Article > 2007
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