Room-temperature ferromagnetism of cu-implanted GaN

Authors
Lee, Jong-HanChoi, In-HoonShin, SangwonLee, SunggooLee, J.Whang, ChungnamLee, Seung-CheolLee, Kwang-RyeolBaek, Jong-HyeobChae, Keun HwaSong, Jonghan
Issue Date
2007-01-15
Publisher
AMER INST PHYSICS
Citation
APPLIED PHYSICS LETTERS, v.90, no.3
Abstract
1 MeV Cu2+ ion was implanted into GaN with a dose of 1x10(17) cm(-2) at room temperature. After implantation, the samples were subsequently performed by rapid thermal annealing at 700, 800, and 900 degrees C for 5 min. Both nonmagnetic Cu ion implanted samples annealed at 700 and 800 degrees C exhibit the ferromagnetism at room temperature, and the saturation magnetization of these samples is estimated to be 0.057 mu(B) and 0.27 mu(B) per Cu atom from M-H curve, respectively. However, the sample annealed at 900 degrees C does not show ferromagnetism due to clustering of Cu during the annealing process. (c) 2007 American Institute of Physics.
Keywords
THIN-FILMS; THIN-FILMS; ion implantation; magnetism; Cu implantation; diluted magnetic semiconductor
ISSN
0003-6951
URI
https://pubs.kist.re.kr/handle/201004/134734
DOI
10.1063/1.2431765
Appears in Collections:
KIST Article > 2007
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