ULSI interconnect failures due to electromigration-induced stress evolution: computer simulation study

Title
ULSI interconnect failures due to electromigration-induced stress evolution: computer simulation study
Authors
박영준Vaibhav K. AndleighCarl V. Thompson최인석주영창
Keywords
electromigration; computer simulation
Issue Date
2000-07
Publisher
Proc. of the 6th Workshop on Atomic-migration and Stress-induced Phenomena in ULSI Metallizations
Citation
, 19-22
URI
http://pubs.kist.re.kr/handle/201004/13592
Appears in Collections:
KIST Publication > Conference Paper
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