Structural analysis of the reconstructed Si(001)-C surface
- Authors
- Park, JY; Seo, JH; Whang, CN; Kim, SS; Choi, DS; Chae, KH
- Issue Date
- 2005-05-22
- Publisher
- AMER INST PHYSICS
- Citation
- JOURNAL OF CHEMICAL PHYSICS, v.122, no.20
- Abstract
- The atomic structure of reconstructed Si(001)c(434)-C surface has been studied by coaxial impact collision ion scattering spectroscopy. When the 100L of ethylene (C2H4) molecules have been exposed on Si(001)-(231) surface at 700 degrees C, it is found that C atoms cause the ordering of missing Si dimer defects and occupy the fourth layer of Si(001) directly below the bridge site. Our results provide the support for the previous model in which a missing dimer structure is accompanied by C incorporation into the subsurface. (c) 2005 American Institute of Physics.
- Keywords
- ION-SCATTERING SPECTROSCOPY; ATOMIC-STRUCTURE; SI(100); GROWTH; ION-SCATTERING SPECTROSCOPY; ATOMIC-STRUCTURE; SI(100); GROWTH; Atomic structure; Silicon; Reconstruction; Ethylene; Low energy ion scattering
- ISSN
- 0021-9606
- URI
- https://pubs.kist.re.kr/handle/201004/136457
- DOI
- 10.1063/1.1908452
- Appears in Collections:
- KIST Article > 2005
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