Growing behavior of AIN thin film deposited by asymmetric bipolar pulsed dc reactive sputtering
- Growing behavior of AIN thin film deposited by asymmetric bipolar pulsed dc reactive sputtering
- 김주형; 이전국; 안진호
- AlN; 박막형 고주파 부품; 비대칭 펄스 직류 스퍼터링; pulse frequency; duty cycle; pulsed dc; arc
- Issue Date
- 한국세라믹학회지; Journal of the Korean Ceramic Society
- VOL 38, NO 1, 61-67
- Appears in Collections:
- KIST Publication > Article
- Files in This Item:
There are no files associated with this item.
- RIS (EndNote)
- XLS (Excel)
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.