Magnetism in nanometer-thick TiOx/Co/TiOx/TiN/Si multilayered structures

Authors
Lee, YHHyun, SYKim, YMPark, IWKim, DHAhn, SYKim, JS
Issue Date
2004-08
Publisher
PERGAMON-ELSEVIER SCIENCE LTD
Citation
SOLID STATE COMMUNICATIONS, v.131, no.7, pp.463 - 467
Abstract
Most studies on Co-doped TiO2 system were focused on thin films grown by MBE-based methods. In this work we report the ferromagnetism of nanometer-thick-layered TiO2/CO/TiO2/TiN film grown on Si substrate by conventional magnetron sputtering. For the growth of TiO2 on silicon, a non-oxide thermally stable material, TiN, was introduced to prevent Ti penetration into the Si substrate. Structural, magnetic, and transport measurements respectively by Raman, SQUID and Hall effect show that our samples are n-type semiconductors and exchange bias effect due to exchange coupling between Co and interfacial CoO. For the rapid vacuum annealed specimen, we found an enhanced loss and a Perminvar-type constricted hysteresis loop, which attributed to pinning of domain walls due to an induced anisotropy by the pair ordering in the metallic alloy of Co-Ti-Si. (C) 2004 Elsevier Ltd. All rights reserved.
Keywords
FILMS; FERROMAGNETISM; ANISOTROPY; ANATASE; SILICON; GROWTH; FILMS; FERROMAGNETISM; ANISOTROPY; ANATASE; SILICON; GROWTH; magnetic multilayer; DMS
ISSN
0038-1098
URI
https://pubs.kist.re.kr/handle/201004/137373
DOI
10.1016/j.ssc.2004.06.004
Appears in Collections:
KIST Article > 2004
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