A single component photoimaging system with styrene copolymers having t-BOC-protected quinizarin dye precursors and photoacid generating groups in a single polymer chain

Authors
Yoo, JHKim, SYCho, IKim, JMAhn, KDLee, JH
Issue Date
2004-07-22
Publisher
ELSEVIER SCI LTD
Citation
POLYMER, v.45, no.16, pp.5391 - 5395
Abstract
A styrene monomer tBQSt, having a tert-butyloxycarbonyloxy (t-BOC)-protected quinizarin dye precursor as a pendent, has been copolymerized with N-(tosyloxy)maleimide (TsOMI) to obtain a dual functional polymer P(tBQSt/TsOMI). The polymer P(tBQSt/TsOMI), as a single component photoimaging system without using an external photoacid generator (PAG), was applied for fluorescent photopatterning by dry process based on the chemical amplification (CA) process. The TsOMI units in the polymer chains were responsible for photochemical generation of p-toluenesulfonic acid by UV exposure and the acid generated in the solution cast polymer film induced the catalytic deprotection of acid labile t-BOC groups of the quinizarin dye precursors. Accordingly, the quinizarin moieties were regenerated in the polymer chains by the CA process, thereby recovering the original color and fluorescence of the quinizarin dye. Fluorescent patterns were readily delineated on the thin polymer films by imagewise UV exposure even without a wet development process. (C) 2004 Elsevier Ltd. All rights reserved.
Keywords
CHEMICAL AMPLIFICATION RESISTS; CHEMICAL AMPLIFICATION RESISTS; protected quinizarin derivatives; N-(tosyloxy)maleimide; single component photoimaging
ISSN
0032-3861
URI
https://pubs.kist.re.kr/handle/201004/137398
DOI
10.1016/j.polymer.2004.05.073
Appears in Collections:
KIST Article > 2004
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