DSpace at KISTKIST Article2004

Magnetoresistance behavior in electroplated and sputtered Bi thin films

Authors
Jeun, M. H.; Lee, K. I.; Lee, K. H.; Kim, D. Y.; Chang, J. Y.; Shin, K. H.; Han, S. H.; Ha, J. G.; Lee, W. Y.
Issue Date
2004-05
Publisher
ELSEVIER SCIENCE BV
Citation
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, v.272, pp.E1455 - E1457
Abstract
The magnetotransport properties of the electroplated and sputtered Bi thin films have been investigated in the range 4 - 300 K. Both the films are found to exhibit very large MR, similar to 600%, at room temperature. The room temperature MR in the sputtered films depends on the grain size, in contrast to the electroplated films. (C) 2003 Elsevier B. V. All rights reserved.
Keywords
magnetotransport; ordinary magnetoresistance; spin injection
ISSN
0304-8853
URI
https://pubs.kist.re.kr/handle/201004/137648
DOI
10.1016/j.jmmm.2003.12.733
Appears in Collections:
KIST Article > 2004
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML
Show Full Item Record

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE