Ultralarge capacitance-voltage hysteresis and charge retention characteristics in metal oxide semiconductor structure containing nanocrystals deposited by ion-beam-assisted electron beam deposition

Title
Ultralarge capacitance-voltage hysteresis and charge retention characteristics in metal oxide semiconductor structure containing nanocrystals deposited by ion-beam-assisted electron beam deposition
Authors
김용박경화정태훈박홍준Jae-Yel Yi최원철김은규이주욱이정용
Keywords
amorphous Si
Issue Date
2001-02
Publisher
Applied physics letters
Citation
VOL 78, NO 7, 934-936
URI
http://pubs.kist.re.kr/handle/201004/13825
ISSN
0003-6951
Appears in Collections:
KIST Publication > Article
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