Sol-gel Mechanism of Self-patternable PZT Film Starting from Alkoxides' Precursors

Authors
Jae-Seob Hwang김우식박형호김태송
Issue Date
2003-08
Publisher
한국세라믹학회
Citation
한국세라믹학회지, v.40, no.4, pp.13 - 13
Keywords
sol-gel; self-patterning; PZT; photosensitizer; UV exposure1. IntroductionSol-gel process contains fractal geometry and percolation theory in physics; hydrolysis and poly-condensation mechanism in chemistry; sintering and structural relaxation in ce; sol-gel; self-patterning; PZT; photosensitizer; UV exposure1. IntroductionSol-gel process contains fractal geometry and percolation theory in physics; hydrolysis and poly-condensation mechanism in chemistry; sintering and structural relaxation in ce
ISSN
1229-7801
URI
https://pubs.kist.re.kr/handle/201004/138353
Appears in Collections:
KIST Article > 2003
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE