Synthesis and application of a new Ti precursor, Ti(MPD)(MDOP) ₂ for the metal-organic chemical vapor deposition of TiO ₂ thin films

Title
Synthesis and application of a new Ti precursor, Ti(MPD)(MDOP) ₂ for the metal-organic chemical vapor deposition of TiO ₂ thin films
Authors
우경자홍성호이완인
Keywords
Ti precursor
Issue Date
2001-05
Publisher
The Second Asian Conference on Chemical Vapor Deposition
Citation
, 219-221
URI
http://pubs.kist.re.kr/handle/201004/13945
Appears in Collections:
KIST Publication > Conference Paper
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