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다음극 직류전원플라즈마 화학 증착법에 의해 합성된 자유막 다이아몬드 웨이퍼의 특성

Other Titles

Properties of a free-standing diamond wafer depoisted by the multi-cathode direct current plasma assisted CVD method

Authors

이재갑; 박종완

Issue Date

2001-11

Publisher

한국진공학회

Citation

한국진공학회지, v.10, no.3, pp.356 - 360

Keywords

CVD diamond

ISSN

1225-8822

URI

https://pubs.kist.re.kr/handle/201004/140033

Appears in Collections:

KIST Article > 2001

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