Synthesis and properties of silicon-containing maleimide polymers based on N-(trimethylsilyl) maleimide

Authors
Ahn, KDChung, CMJo, HSRhee, JM
Issue Date
1998-12
Publisher
JOHN WILEY & SONS LTD
Citation
POLYMER INTERNATIONAL, v.47, no.4, pp.407 - 412
Abstract
N-(Trimethylsilyl)maleimide (TMSMI) has been polymerized with various styrenic monomers (XSt) in the presence of a radical initiator to give high-molecular-weight, alternating copolymers in high yields. The copolymers P(TMSMI/XSt) have high glass transition temperatures above 200 degrees C and thermal decomposition temperatures in the range 320-360 degrees C. The thermal and acidolytic deprotection of trimethylsilyl (TMS) groups of TMSMI units in the copolymers have been investigated. UV irradiation and subsequent heating of a film of P(TMSMI/t-BOCSt) containing a photoacid generator resulted in deprotection of the protecting groups by the photogenerated acids, thereby causing a significant change in solubility of the polymer. Thus positive image patterns were obtained with P(TMSMI/t-BOCSt) by photolithographic processes. (C) 1998 Society of Chemical Industry.
Keywords
DEEP-UV RESIST; POLYMERIZATION; COPOLYMERIZATION; DEEP-UV RESIST; POLYMERIZATION; COPOLYMERIZATION; N-(trimethylsilyl)maleimide; thermal stability; silicon-containing maleimide polymer; acidolytic deprotection; photoresist materials
ISSN
0959-8103
URI
https://pubs.kist.re.kr/handle/201004/142705
DOI
10.1002/(SICI)1097-0126(199812)47:4<407::AID-PI76>3.0.CO;2-Z
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