DSpace at KIST: Processing and characterization of a direct bonded SOI using SiO//2 Thin Film

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DC Field	Value	Language
dc.contributor.author	신동운	-
dc.contributor.author	최두진	-
dc.contributor.author	김긍호	-
dc.date.accessioned	2024-01-21T17:37:28Z	-
dc.date.available	2024-01-21T17:37:28Z	-
dc.date.created	2022-01-10	-
dc.date.issued	1998-01	-
dc.identifier.issn	1229-7801	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/143358	-
dc.publisher	한국세라믹학회	-
dc.title	Processing and characterization of a direct bonded SOI using SiO//2 Thin Film	-
dc.title.alternative	SiO//2 박막을 이용한 SOI 직접접합공정 및 특성	-
dc.type	Article	-
dc.description.journalClass	2	-
dc.identifier.bibliographicCitation	한국세라믹학회지 = Journal of the Korean Ceramic Society, v.35, no.6, pp.535 - 542	-
dc.citation.title	한국세라믹학회지 = Journal of the Korean Ceramic Society	-
dc.citation.volume	35	-
dc.citation.number	6	-
dc.citation.startPage	535	-
dc.citation.endPage	542	-
dc.subject.keywordAuthor	SOI(Silicon on Insulator)	-

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