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RF power dependence of stresses in plasma deposited low resistive tungsten films for VLSI devices

Other Titles

고집적 소자에 적용되는 저저항 텅스텐 박막에서 응력의 RF power의존성

Authors

이창우; 고민경; 오환원; 우상록; 윤성로; 김용태; 박영균; 고석중

Issue Date

1998-01

Citation

한국재료학회지 = Korean Journal of Materials Research, v.8, no.11, pp.977 - 981

Keywords

diffusion barrier; tungsten; VLSI; PECVD; stress

ISSN

1225-0562

URI

https://pubs.kist.re.kr/handle/201004/143373

Appears in Collections:

KIST Article > Others

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