Two magnetic phases in the co-sputtered Fe-Si3N4 thin film

Authors
Han, SMYu, SCKim, WTHan, SHKim, HJ
Issue Date
1997-09
Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Citation
IEEE TRANSACTIONS ON MAGNETICS, v.33, no.5, pp.3610 - 3612
Abstract
The structure and magnetic properties of Fe-Si3N4 thin films fabricated by a co-sputtering technique mere studied by X-ray diffractometry and magnetometry. With increasing area fraction of Si3N4 pieces on Fe target, magnetization of the films decreased due to reduced Fe content and reduced grain size of bce crystalline phase, Temperature dependence and field dependence of magnetization of co-sputtered thin films can be explained bg a mixture of two types of particles showing paramagnetism and ferromagnetism.
Keywords
ALLOYS; ALLOYS; Fe-Si3N4; thin film; magnetic
ISSN
0018-9464
URI
https://pubs.kist.re.kr/handle/201004/143624
DOI
10.1109/20.619513
Appears in Collections:
KIST Article > Others
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