Transient characteristics of nitrogen gas-pulsed electron cyclotron resonance plasma

Authors
Park, YJOzasa, KOKeeffe, PAoyagi, YMin, SK
Issue Date
1996-09
Publisher
AMER INST PHYSICS
Citation
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.14, no.5, pp.2814 - 2819
Abstract
Transient optical emission characteristics of a nitrogen gas-pulsed electron cyclotron resonance (ECR) plasma have been investigated as a first step towards understanding the nature of a nitrogen gas-pulsed plasma. We observed different transient optical emission profiles for the first negative N-2(+), the second positive N-2*, and the first positive N-2* emission bands in nitrogen gas-pulsed ECR plasma that are closely related to the pressure changes in a discharge cavity of the plasma source. On the basis of the transient emission profiles, optical emission spectra over the wavelength range 300-700 nm were obtained for three specific time regions within the pulse. During the gas-pulsed injection period large ratios of N-2*/N-2(+) (2.5-7.1) and low electron temperatures (1.2 eV) were observed. On the other hand, small ratios of N-2*/N-2(+) (0.3) and high electron temperature (2.5 eV) were recorded 0.65 a after stopping the gas-pulsed injection. These observed N-2*/N-2(+) ratios are interpreted in terms of different excitation processes and electron temperatures (T-e) due to the surge of neutral N-2 gas. The N-2*/N-2(+) ratios in an ECR gas-pulsed plasma are 5-7 times higher than those in continuous wave plasma. Through timing optimization of the transient characteristics, nitrogen gas-pulsed ECR plasma is considered to be a useful candidate for high efficiency p -type high doping in Zn(Se,Te) semiconductors or for the plasma deposition of nitride films. (C) 1996 American Vacuum Society.
Keywords
MOLECULAR-BEAM EPITAXY; HYDROGEN PLASMA; P-TYPE; GROWTH; ZNSE; MOLECULAR-BEAM EPITAXY; HYDROGEN PLASMA; P-TYPE; GROWTH; ZNSE; gas-pulsed plasma
ISSN
0734-2101
URI
https://pubs.kist.re.kr/handle/201004/144337
DOI
10.1116/1.580204
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KIST Article > Others
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