The effect of plasma exposure and annealing atmosphere on shallow junction formation using plasma source ion implantation

Title
The effect of plasma exposure and annealing atmosphere on shallow junction formation using plasma source ion implantation
Authors
조정희한승희이연희김옥경김곤호김영우임현의
Keywords
PSII; recoil implantation; out-diffusion; ultra-shallow junction
Issue Date
2002-08
Publisher
Surface and Coatings Technology
Citation
VOL 157, NO 1, 19-25
URI
http://pubs.kist.re.kr/handle/201004/14455
ISSN
0257-8972
Appears in Collections:
KIST Publication > Article
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