Characteristics of the plasma-induced GaAs nitride layer and its application for the selective area growth.

Authors
김성일민석기김은규박영주최원철이상훈손맹호
Issue Date
1996-01
Citation
Bulletin of the Korean physical society, v.v. 14, no.no. 2, pp.507 - ?
Keywords
MOCVD
URI
https://pubs.kist.re.kr/handle/201004/144752
Appears in Collections:
KIST Article > Others
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