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dc.contributor.author김성일-
dc.contributor.author민석기-
dc.contributor.author김은규-
dc.contributor.author최범호-
dc.contributor.author황성우-
dc.contributor.author정석구-
dc.contributor.author김태근-
dc.date.accessioned2024-01-21T20:07:53Z-
dc.date.available2024-01-21T20:07:53Z-
dc.date.created2022-01-10-
dc.date.issued1996-01-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/144760-
dc.title100 ㎚ electron beam lithography using a modified scanning electron microscope.-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitationBulletin of the Korean physical society, v.v. 14, no.no. 2, pp.539 - ?-
dc.citation.titleBulletin of the Korean physical society-
dc.citation.volumev. 14-
dc.citation.numberno. 2-
dc.citation.startPage539-
dc.citation.endPage?-
dc.subject.keywordAuthorMOCVD-
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