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dc.contributor.authorChung, C.-M.-
dc.contributor.authorAhn, K.-D.-
dc.date.accessioned2024-01-21T20:14:15Z-
dc.date.available2024-01-21T20:14:15Z-
dc.date.created2021-09-02-
dc.date.issued1996-01-
dc.identifier.issn0914-9244-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/144868-
dc.description.abstract[No abstract available]-
dc.languageEnglish-
dc.publisherTokai University-
dc.titlePhotochemical acid generation and resist application of camphorsulfonyloxymaleimide copolymers-
dc.typeArticle-
dc.identifier.doi10.2494/photopolymer.9.553-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJournal of Photopolymer Science and Technology, v.9, no.4, pp.553 - 556-
dc.citation.titleJournal of Photopolymer Science and Technology-
dc.citation.volume9-
dc.citation.number4-
dc.citation.startPage553-
dc.citation.endPage556-
dc.description.journalRegisteredClassscopus-
dc.identifier.scopusid2-s2.0-0345119736-
dc.type.docTypeArticle-
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