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A study on the growth behaviors of MoSi2 diffusion layer formed by CVD of Si on Mo substrate

Other Titles

Si의 화학증착에 의한 MoSi2 확산층의 성장거동에 관한 연구

Authors

윤진국; 변지영; 김재수; 최종술

Issue Date

1995-11

Publisher

대한금속.재료학회

Citation

대한금속 . 재료학회지 = Korean journal of metals and materials, v.33, no.11, pp.1537 - 1543

Keywords

chemical vapor deposition

ISSN

1738-8228

URI

https://pubs.kist.re.kr/handle/201004/144932

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KIST Article > Others

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