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Selective etching characteristics of ITO/semiconductor and ITO/BaTiO//3 structures by reactive ion etching.

Other Titles

Reactive ion etching 에 의한 ITO/ 반도체 및 ITO/BaTiO//3 구조의 선택적 에칭 특성 =

Authors

강광남; 이정일; 한일기; 이윤희; 김회종; 이석; 오명환; 김선호; 박홍이

Issue Date

1995-01

Citation

전자공학회논문집 A, v.v. 32, no.no. 1, pp.152 - ?

Keywords

reactive ion etching

URI

https://pubs.kist.re.kr/handle/201004/145306

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KIST Article > Others

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