Full metadata record
DC Field | Value | Language |
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dc.contributor.author | YOON, YS | - |
dc.contributor.author | LEE, DH | - |
dc.contributor.author | KIM, TS | - |
dc.contributor.author | OH, MH | - |
dc.contributor.author | YOM, SS | - |
dc.date.accessioned | 2024-01-21T21:38:05Z | - |
dc.date.available | 2024-01-21T21:38:05Z | - |
dc.date.created | 2022-01-10 | - |
dc.date.issued | 1994-05 | - |
dc.identifier.issn | 0734-2101 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/145590 | - |
dc.description.abstract | Metalorganic chemical vapor deposition of BaTiO3 thin films on indium tin oxide-coated soda lime glass substrate in the temperature range between 400 and 550-degrees-C was investigated to produce an insulating layer with high breakdown voltage and a smooth surface for electroluminescence display. In order to prevent the diffusion of sodium ions toward the indium tin oxide layer and BaTiO3 insulating layer, the deposition temperature should not be higher than 500-degrees-C. X-ray diffraction patterns showed that the BaTiO3 thin film deposited at 400-degrees-C was amorphous. The stoichiometry of the films was identified by Auger electron spectroscopy. Scanning electron microscopy results suggested that BaTiO3 thin films deposited at 400-degrees-C had smooth surfaces without defects such as pinholes and clusters, but surface flatness decreased at the deposition temperature of 550-degrees-C. The dielectric constant was 12.9. The breakdown voltage determined from current-voltage measurements was as large as 2 X 10(6) V/cm. | - |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.title | PREPARATION OF AMORPHOUS BATIO3 THIN-FILMS ON INDIUM TIN OXIDE-COATED SODA LIME GLASS BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION | - |
dc.type | Article | - |
dc.identifier.doi | 10.1116/1.578818 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.12, no.3, pp.751 - 753 | - |
dc.citation.title | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | - |
dc.citation.volume | 12 | - |
dc.citation.number | 3 | - |
dc.citation.startPage | 751 | - |
dc.citation.endPage | 753 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | A1994NL92500021 | - |
dc.identifier.scopusid | 2-s2.0-0012554568 | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordAuthor | thin films | - |
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