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dc.contributor.author김용태-
dc.contributor.author이창우-
dc.date.accessioned2024-01-21T21:45:08Z-
dc.date.available2024-01-21T21:45:08Z-
dc.date.created2022-01-10-
dc.date.issued1994-01-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/145706-
dc.titleStress relaxation in plasma deposited tungsten nitride/tungsten bilayer.-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitationAppl. phys. lett., v.v. 65, no.no. 8, pp.965 - 967-
dc.citation.titleAppl. phys. lett.-
dc.citation.volumev. 65-
dc.citation.numberno. 8-
dc.citation.startPage965-
dc.citation.endPage967-
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