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Sulfonate 광산발생제를 사용하는 화학증폭 포토레지스트의 Catalytic chain length 및 특성곡선

Other Titles

Catalytic chain length and characteristic curve in a chemical amplification photoresist using sulfonate photoacid generator

Authors

양승관; 박찬언; 안광덕

Issue Date

1993-05

Publisher

한국고분자학회

Citation

폴리머, v.17, no.3, pp.335 - 340

Keywords

catalytic chain length; deep UV photoresists; photoacid generator; pyrogallol tris(methane sulfonate); t-BOC-protected phosphazene; dissolution inhibition; chemical amplification resist

ISSN

0379-153X

URI

https://pubs.kist.re.kr/handle/201004/146050

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KIST Article > Others

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