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dc.contributor.author염상섭-
dc.contributor.author윤영수-
dc.contributor.authorW. N. Kang-
dc.contributor.authorH. S. Shin-
dc.contributor.authorT. W. Kim-
dc.contributor.authorJ. H. Lee-
dc.contributor.authorD. J. Choi-
dc.contributor.authorS. S. Back-
dc.date.accessioned2024-01-21T22:36:35Z-
dc.date.available2024-01-21T22:36:35Z-
dc.date.created2022-01-10-
dc.date.issued1993-02-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/146111-
dc.titleStructural properties of BaTiO3 thin films on Si grown by metalorganic chemical vapor deposition-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitationJournal of applied physics, v.73, no.3, pp.1547 - 1547-
dc.citation.titleJournal of applied physics-
dc.citation.volume73-
dc.citation.number3-
dc.citation.startPage1547-
dc.citation.endPage1547-
dc.subject.keywordAuthorthin films-
dc.subject.keywordAuthorBaTiO3-
dc.subject.keywordAuthorMOCVD-
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