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dc.contributor.author김용태-
dc.contributor.author이창우-
dc.contributor.author민석기-
dc.date.accessioned2024-01-21T22:39:12Z-
dc.date.available2024-01-21T22:39:12Z-
dc.date.created2022-01-10-
dc.date.issued1993-01-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/146153-
dc.titlePerformance of the plasma deposited tungsten nitride diffusion barrier for Al and Au metallization.-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitationJpn. j. of appl. phys., v.v. 32, pp.6126 - 6131-
dc.citation.titleJpn. j. of appl. phys.-
dc.citation.volumev. 32-
dc.citation.startPage6126-
dc.citation.endPage6131-
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