Electrical microstructural properties of BaTiO3 thin films on p-Si substrates grown by metalorganic chemical vapor deposition

Authors
염상섭윤영수이종용M. JungT. W. KimW. N. KangH. S. Shin
Issue Date
1993-01
Citation
Solid state communications, v.v. 86, no.no. 9, pp.565 - 568
Keywords
thin films; BaTiO3; MOCVD
URI
https://pubs.kist.re.kr/handle/201004/146212
Appears in Collections:
KIST Article > Others
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