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dc.contributor.author배귀남-
dc.contributor.author박승오-
dc.contributor.author이춘식-
dc.contributor.author명현국-
dc.contributor.author신흥태-
dc.date.accessioned2024-01-21T22:43:02Z-
dc.date.available2024-01-21T22:43:02Z-
dc.date.created2022-01-10-
dc.date.issued1993-01-
dc.identifier.issn1229-6422-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/146218-
dc.languageKorean-
dc.publisher대한설비공학회-
dc.titleWafer surface scanner 를 이용한 반도체 웨이퍼상의 입자 침착속도의 측정-
dc.title.alternativeMeasurement of particle deposition velocity toward a horizontal semiconductor wafer using a wafer surface scanner.-
dc.typeArticle-
dc.description.journalClass2-
dc.identifier.bibliographicCitation설비공학 논문집, v.5, no.2, pp.130 - 140-
dc.citation.title설비공학 논문집-
dc.citation.volume5-
dc.citation.number2-
dc.citation.startPage130-
dc.citation.endPage140-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassother-
dc.subject.keywordAuthorparticle deposition velocity-
dc.subject.keywordAuthor입자의 침착속도-
dc.subject.keywordAuthorsemiconductor wafer-
dc.subject.keywordAuthor반도체 웨이퍼-
dc.subject.keywordAuthorconvection-
dc.subject.keywordAuthor대류-
dc.subject.keywordAuthordiffusion-
dc.subject.keywordAuthor확산-
dc.subject.keywordAuthorsedimentation-
dc.subject.keywordAuthor중력침강-
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