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Modification of PMMA for a deep UV photoresist : 1. Photodegradation of P(MMA-co-BOXM-co-TBMA).

Other Titles

원자외선 포토레지스트로서 PMMA 의 개질에 관한 연구 : 1. P(MMA-co-BOXM-co-TBMA) 의 광분해반응 =

Authors

안광덕; 채규호; 황인동; 박서호

Issue Date

1992-11

Citation

폴리머 = Polymer(Korea), v.v. 16, no.no. 6, pp.669 - 679

Keywords

deep UV photoresist; photodegradation of poly(methyl methacrylate); butanedione monooxime methacrylate; terpolymer; photosensitivity

URI

https://pubs.kist.re.kr/handle/201004/146363

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KIST Article > Others

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