Novel titanium compounds for metal-organic chemical vapor deposition of titanium dioxide films with an ultrahigh deposition rate.

Title
Novel titanium compounds for metal-organic chemical vapor deposition of titanium dioxide films with an ultrahigh deposition rate.
Authors
우경자이완인이종성강상욱
Keywords
Ti precursor
Issue Date
2003-04
Publisher
Inorganic Chemistry
Citation
v. 42, no. 7, 2378-2383.
URI
http://pubs.kist.re.kr/handle/201004/14637
ISSN
0020-1669
Appears in Collections:
KIST Publication > Article
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