Metalorganic chemical vapor deposition of BaTiO//3 thin films on Si.

Other Titles
유기금속 화학기상증착법에 의한 Si 기판위의 BaTiO//3 박막증착 =
Authors
염상섭윤영수최상삼D. H. Lee
Issue Date
1992-01
Citation
응용물리 = Korean appl. phys., v.v. 5, pp.193 - 197
Keywords
thin films; BaTiO//3; MOCVD
URI
https://pubs.kist.re.kr/handle/201004/146575
Appears in Collections:
KIST Article > Others
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